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德國ALLRESIST導電膠AR-PC5090和AR-PC5091

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深圳市藍星宇電子科技有限公司

德國

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產品介紹

產品詳情

Protective Coating PMMA Electra 92 (AR-PC 5090)

Conductive protective coating for non-novolak-based e-beam resists

Top layer for the dissipation of e-beam charges on insulating substrates

英國ALLRESIST防護涂層PMMA Electra 92 (AR-PC 5090)

用于非氮基電子束電阻的導電保護涂層

用于在絕緣襯底上耗散電子束電荷的頂層

Characterisation 描述

- as protective coating， this resist is not sensitive to light / radiation

- thin， conductive layers for the dissipation of charges during electron exposure

- coating of non-novolac PMMA， CSAR 62， HSQ et al.

- longterm-stable and cost-efficient alternative to Espacer

- easy removal with water after exposure

- polyaniline-derivative dissolved in water and IPA

Conductivity 導電率

Resistance measurements of AR-PC 5090.02 layers obtained after spin deposition. For thinner films， the resistance increases and the conductivity decreases.

Process parameters 工藝參數

REM dissipation of charges

200 nm-squares written on quartz without distortion caused by charges with AR-P 662.04 and AR-PC 5090.02

Protective Coating PMMA Electra 92 (AR-PC 5090)

Process conditions

This diagram shows exemplary process steps for resist Electra 92 - AR-PC 5090.02 and PMMA-resist AR-P 664.04.

All specifications are guideline values which have to be adapted to own specific conditions.

Processing instructions

The conductivity may be varied by adjusting the thickness with different rotational speeds. Thicker layers of 90 nm thus have a 2.5 times higher conductivity as compared to 60 nm thick layers.

For the build-up of an even conductive layer， the substrate should be wetted with the resist solution before the spin process is started.

Protective Coating Novolac Electra 92 (AR-PC 5091)

Conductive protective coating for novolac-based e-beam resists

Top layer for the dissipation of e-beam charges on insulating substrates

Characterisation

- as protective coating， this resist is not sensitive to light / radiation

- thin， conductive layers for the dissipation of charges during electron exposure

- coating of novolac-based e-beam resist AR-N 7000

- longterm-stable and cost-efficient alternative to Espacer

- easy removal with water after exposure

- polyaniline-derivative dissolved in water and IPA

Conductivity

Resistance measurements of AR-PC 5091.02 layers obtained after spin deposition. For thinner films， the resistance increases and the conductivity decreases.

Note: Novolac-based e-beam resists possess other surface properties than CSAR 62 or PMMA. AR-PC5091 was thus developed with a different solvent mixture. In all other respects however， the polymer composition of AR-PC 5090 and AR-PC 5091 is identical so that both resists are referred to as “Electra 92“.

Process parameters

REM dissipation of charges

50 nm lines written on glass at a pitch of 150 nm with AR-N 7520.07 and AR-PC 5091.02

Protective Coating Novolac Electra 92 (AR-PC 5091)

Process conditions

This diagram shows exemplary process steps for resist Electra 92 (AR-PC 5091.02) and e-beam resist AR-N 7520.07neu. All specifications are guideline values which have to be adapted to own specific conditions.

Processing instructions

The conductivity may be varied by adjusting the thickness with different rotational speeds. Thicker layers of 90 nm thus have a 2.5 times higher conductivity as compared to 60 nm thick layers. In the case that crack formation is observed after tempering of the protective coating， the tempering step can be omitted.

For the build-up of an even conductive layer， the substrate should be wetted with the resist solution before the

spin process is started.

Protective Coating Electra 92

Application examples for PMMA-Electra 92

Shelf live of Electra 92

Conductivity properties of differently aged Electra 92 batches

The conductivity was determined as a function of the measured temperature. At temperatures < 100 °C， both resists show a virtually identical conductivity. Electra 92 is thus characterised by a very long shelf life. Conductivity measurements up to a temperature of 160°C which were performed directly on a hotplate showed a large increase of the conductivity by a factor of 10 (see diagram). This fact is due to the complete removal of water from the layer. After a few hours of air humidity absorption under room conditions， the conductivity decreases again to

the initial value. In the high vacuum of e-beam devices， the water is also completely removed and the conductivity thus increases accordingly. This effect has been demonstrated in direct conductivity measurements under mediate vacuum conditions. Temperatures above 165 °C destroy the polyaniline irreversibly and no conductivity is observed any more

CSAR 62 on glass with Electra 92 for deriving

30 – 150 nm squares of CSAR 62 on glass

The combination of CSAR 62 with Electra 92 - AR-PC5090.02 offers the best options to realise complex ebeam structuring processes on glass or semi-insulating substrates like e.g. gallium arsenide. The excellent sensitivity and highest resolution of the CSAR are complemented harmoniously by the conductivity of Electra 92.

CSAR 62 and Electra 92 on glass

At a CSAR 62 film thickness of 200 nm， squares with an edge length of 30 nm could reliably be resolved on glass.

PMMA Lift-off on glass with Electra 92

200 nm squares produced with 2-layer PMMA lift-off

Initially， the PMMA resist AR-P 669.04 (200 nm thickness) was coated on a quartz substrate and tempered. The se cond PMMA resist AR-P 679.03 was then applied (150nm thickness) and tempered， followed by coating with Electra 92. After exposure， Electra 92 was removed with

water， the PMMA structures were developed (AR 600-56) and the substrate vaporised with titanium/gold. After a liftoff with acetone， the desired squares remained on the glass with high precision.

PMMA-Lift-off auf Glas mit Electra 92

Protective Coating Electra 92

Application examples for PMMA Electra 92

Electra 92 with HSQ on quartz

20 nm bars of HSQ， prepared on quartz AR-PC 5090.02

After a coating of Electra 92 on an HSQ resist， even this resist can be patterned on a quartz substrate with very high quality. The HSQ resist (20 nm thickness) was irradiated with the required area dose of 4300 μC/cm2.

SX AR-PC 5000/90.2 was subsequently completely removed within 2 minutes with warm water and no residues could be detected. After development of the HSQ resist， the structures with high-precision 20 nm bars remained.

Lift-off struktures on garnet

Lift-off structures on garnet (University of California， Riverside，Department of Physics and Astronomy)

Plasmonic structures on quartz

Silver nanoparticles on quartz， generated with AR-P 672.11 and ARPC 5090.02 (Aarhus University， Denmark)

Application examples for Novolac Electra 92

Electra 92 and AR-N 7700 on glass

60 – 150 nm squares (100 nm height) on glass with AR-N 7700.08 and AR-P 5091.02

Novolac-based e-beam resists possess other surface properties than CSAR 62 or PMMA. For this reason， AR-PC5091.02 was designed with a different solvent composition. E-beam resist AR-N 7700.08 was at first spincoated on glass， dried， coated with Electra 92 and baked at 50 °C. After irradiation， the Electra layer was removed within 1 minute with water and the e-beam resist then developed. The resulting resolution of 60 nm is very high for chemically amplified resists.

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