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儀器簡介：The e-flux Mini E-Beam Evaporator is an UHV evaporator for small and medium quantities of almost any material in the temperature

range of 400K to 3100K. Evaporation is possible either directly from evaporant in rod form (?26mm)

or out of a crucible. An integrated flux monitor allows maximum deposition control.

Highly efficient watercooling ensures negligible outgassing during operation.

The e-flux electron beam evaporator is very compact and mounted on a CF-40 flange (2.75"OD).

很容易安裝在已經有的 UHV 或 MBE系統上。

主要應用是：表面科學，薄膜沉積，薄膜摻雜

主要蒸發材料： Mo， Ta， W， Au， Ag， Pt， Al， Cu， Ni， Ti， C， Si， Cr

技術參數：

真空腔體內長度: 190mm (without options). Special length possible on request.

**真空端直徑: 34mm

安裝法蘭口徑: NW40CF (2.75"OD)

烘烤溫度: max. 200°C

rod feed棒材: 25mm， optionally 50mm

坩堝體積: 0，3ccm

坩堝材料: Mo， Ta， W， pyrol. Graphite， BN liner， Al2O3， Quartz

沉積速率: from <0，01A/s to >2nm/s

束流發散角: ±15° (±12° with flux monitor)

電子束功率: max. 600W

控制器: 19" rack mount， 3U high，

230VAC/50Hz

選項:

擋板 (manual and motorised)

flux monitor/flux controller， Deposition Controller*

熱電偶

離子阱

各種坩堝 (see above) with end caps for horizontal mount

motorised rod feed

control options (schematic)

主要特點：

獨有特點:

1，發射電流穩定性:

The emission current stabilizer is a closed loop control to keep the emission

current constant automatically with rod melting down or decrease of crucible content

2，LED提示棒材位置

An LED alerts when the evaporation rod has to be fed. Threshold can be customer set.

3，可輸入需要的發射電流

The emission current can now be set directly on a linear scale for easy reproduction.

4，離子阱選項

The ion trap option allows to deflect all charged particles out of the beam.