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面議
767
儀器簡(jiǎn)介:
The ZCUVE represents the most recent advance in water vapor desorption technology. The unique design is scalable from 2.75” to 8” flange sizes with a proportionally higher UV power factor with larger flange sizes.
The ZCUVE was designed to desorb water from large deposition chambers where it is not practicable to have an exposed UV emitter inside the vacuum chamber. Standard off-the-shelf shutters can be used to prevent the ZCUVE from being coated during deposition processes.
This process works best on o-ring (Viton) sealed vacuum chambers that do not have any other way to bake out, and also for smaller sized load-locks.技術(shù)參數(shù):
型號(hào) | 法蘭口徑 |
---|---|
Z275 | 2.75" / 40 CF |
Z450 | 4.5" / 63 CF |
Z600 | 6.0” / 100 CF |
Z800 | 8.0” / 160 CF |
An external assembly houses the UV emitter, which is situated just behind a high UV transmission, ultra-high vacuum window. A mirror on the back side of the emitter further improves the transmission of 185 nm UV radiation through the window and into the vacuum chamber. The ZCUVE housing is backfilled with an inert gas to prevent ozone production within the housing. Finally, the emitter leads are connected via MHV high voltage connectors to the control.
ZCUVE - Shutter Closed | ZCUVE - Shutter Open |
主要特點(diǎn):
The advantage of using UVC radiation to desorb water vapor is that is produces very
little heat. Less heat means less damage
to mechanical parts and samples.
Another advantage is that UVC does not require a direct line of site in order to desorb
water vapor. It can’t get into nooks and
crannies, but it can reflect off of polished surfaces (like chamber walls) with
a loss of 50% to 70% per " bounce" .
The UVB-100 uses UVC radiation to desorb water vapor without heat. The emitter extends into the vacuum chamber.
The ZCUVE (Zero Clearance UV Emitter Water Vapor Desorption System) uses UVC radiation to desorb water vapor without heat. The emitter resides outside the vacuum chamber.
Note:These water vapor desorption products are designed to work with high vacuum systems, large vacuum, chambers, and load locks. They are not designed to replace radiant bake-out methods in ultra-high vacuum systems, but are UHV compatible
熱絲CVD金剛石膜沉積設(shè)備HF450
XRD-晶向定位
CVD 真空化學(xué)氣相沉積設(shè)備
等離子體增強(qiáng)化學(xué)氣相沉積系統(tǒng)CVD
BTF-1200C-RTP-CVD
自動(dòng)劃片機(jī)
FM-W-PDS
Gasboard-2060
等離子化學(xué)氣相沉積系統(tǒng)-PECVD
Pentagon Qlll
定制-電漿輔助化學(xué)氣相沉積系統(tǒng)-詳情15345079037